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VS210H Vacuum Reflow System

Classification:

High-performanced Vacuum Reflow Oven

Key words:

  • Product Description
  • Technical Parameters
  • Technical Advantage
  • Vacuum reflow system is the specialized equipment which provides a good process environment for alloy soldering of electronic devices by using the principle of vacuum heating, auxiliary formic acid, positive pressure and other technolog / ical means. The equipment is widely used in high-power semiconductor laser, optical communication semiconductor laser, Lidar device, TR component, hybrid circuit, /discrete device, MEMS device, IGBT, high-power LED, infrared device and other advanced device packaging. It can realize the perfect soldering of high reliability, high vacuum and low cavity of this kind of device.

  • Drag and drop the dropdown bar on the right to view more parameters

    Technical Parameters

    HC-VS210E

    HC-VS200E

    HC-VS210H

    HC-VS330H

    HC-VS460H

    Maximum temperature

    450℃

    450℃

    450℃ (Higher optional)

    450℃ (Higher optional)

    450℃

    Temperature control precision

    ±0.5℃

    ±0.5℃

    ±0.5℃

    ±0.5℃

    ±0.5℃

    Area of heating plate

    (227*217)mm2

    (350*290)mm2

    (227*217)mm2

    (330*320)mm2

    (460*420)mm2

    Temperature uniformity

    ±1.5%

    ±1.5%

    ±1%

    ±1%

    ≤±2%

    Ultimate vacuum(mechanical pump)

    ≤5Pa

    ≤5Pa

    ≤5Pa

    ≤5Pa

    ≤5Pa

    Ultimate vacuum(Molecular pump)

    N

    N

    ≤5x10-3pa (Higher optional)

    ≤5x10-3pa (Higher optional)

    N

    Leakage rate of vacuum chamber

    5x10-8 mbar*l/s

    5x10-8 mbar*l/s

    5x10-9 mbar*l/s

    5x10-9 mbar*l/s

    5x10-9 mbar*l/s

    Formic acid process module

    标配

    标配

    标配

    标配

    标配

    Positive pressure function

    N

    N

    0.3MPa

    0.3MPa

    N

    Maximum heating rate
    (bottom heating without load)

    200℃/min

    200℃/min

    200℃/min

    200℃/min

    200℃/min

    Maximum cooling rate
    (N2-cooled without load)

    100℃/min

    100℃/min

    100℃/min

    100℃/min

    100℃/min

    Maximum height of device

    100mm

    100mm

    100mm(150mm)

    100mm(150mm)

    100mm  

    Top heating

    N

    N

    Optional

    Optional

    Standard

    Water cooling

    N

    N

    N

    Optional

    Optional

    Chamber door open/close

    Semi-automatic Semi-automatic Automatic Automatic Automatic

    MES interface

    Optional

    Optional

    Standard

    Standard

    Standard

    Barcode scanner

    Optional

    Optional

    Optional

    Optional

    Optional

    Flux module

    N

    Optional

    N

    Optional

    Optional

    * The temperature uniformity is tested and verified by a third-party TC Wafer. The temperature is tested and calibrated with thermoregulator from American Omega.

  •   1、Software: The interface of software is simple and intuitive. The data and process curves can be freely controlled, and the software supports offline viewing and analysis.

      2、The capability of temperature control: The equipment uses Germany Siemens industrial control system and Siemens temperature measurement module for accurate closed-loop control. The temperature control accuracy is ±0.5℃.

      3、Heating module: The infrared quartz lamp imported from Japan is used for radiation heating, and the life of the lamp is 5000 hours at full power.

      4、Temperature control method: Partition temperature control is adopted. Independent intellectual property rights. PID adjusts the inported power regulator automatically for precise temperature control. The temperature uniformity in effective area is measured by TC Wafer with ≤ ±1~1.5%.

      5、Positive pressure process: 0.3MPa. The accuracy of pressure control is ±5%, which can effectively remove tiny holes, control solder overflow, and prevent flux spatter. It is especially suitable for the welding of diode laser bar and high-power diode laser chip, vacuum packing of MEMS device, AuSn seal of electronic device, Micro-LED packing and other applications for advanced packing.

      6、Process gas path: There are 2 MFC for precise control. The nitrogen flow rate is 50slm, and the formic acid flow rate is 30slm.

      7、Cooling method: Air cooling/ water cooling. Water cooling can be used in vacuum seal process. The cooling rate is controllable, and the stress after welding can be effectively improved.

      8、Chamber lid: The lid has the function of opening and closing safety protection, which can automatically open and close without impact.

      9、MES function: With open OPC/UA protocol, users can simply interconnect with MES system.

        10、Automation integration: With the upgraded online automatic loading and unloading function, the machine hand can automatically take and place samples. The barcode scanner scans codes online, and the chamber door opens and closes automatically and executes procedures.

      11、Safety function: Overtemperature protection function, water flow and air pressure monitoring function, formic acid pipeline pressure control, chamber door interlock function under positive pressure.

      12、The equipment supports the rapid temperature rise and fall heat treatment process of the bare wafer.

      13、Multistage pressure and vacuum control are optional.

           *Note: the preceding advantages or functions are subject to actual configurations.

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